Invention Application
- Patent Title: METHOD OF FORMING STRUCTURES FOR THRESHOLD VOLTAGE CONTROL
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Application No.: US17529562Application Date: 2021-11-18
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Publication No.: US20220165575A1Publication Date: 2022-05-26
- Inventor: Qi Xie , Giuseppe Alessio Verni , Tatiana Ivanova , Perttu Sippola , Michael Eugene Givens , Eric Shero , Jiyeon Kim , Charles Dezelah , Petro Deminskyi , Ren-Jie Chang
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Main IPC: H01L21/28
- IPC: H01L21/28 ; H01L21/02 ; C23C16/52 ; C23C16/455
Abstract:
Methods and systems for depositing threshold voltage shifting layers onto a surface of a substrate and structures and devices formed using the methods are disclosed. An exemplary method includes using a cyclical deposition process, depositing a threshold voltage shifting layer onto a surface of the substrate.
Public/Granted literature
- US3213053A Antistatic composition and treatment of synthetic linear polymer texiles therewith Public/Granted day:1965-10-19
Information query
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