Invention Application
- Patent Title: PROCESSING APPARATUS AND PROCESSING METHOD
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Application No.: US17436795Application Date: 2020-03-02
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Publication No.: US20220168850A1Publication Date: 2022-06-02
- Inventor: Yohei YAMASHITA
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Priority: JP2019-064378 20190328
- International Application: PCT/JP2020/008615 WO 20200302
- Main IPC: B23K26/53
- IPC: B23K26/53 ; B23K26/08 ; B23K26/03 ; B23K26/062

Abstract:
In forming modification layers by radiating laser light to an inside of a processing target object from a modifying device periodically while rotating the processing target object held by a holder relative to the modifying device by a rotating mechanism and by moving the modifying device relative to the holder in a diametrical direction by a moving mechanism, a boundary position of the laser light in the diametrical direction is calculated, the boundary position being a position where a circumferential distance between the modification layers becomes a required threshold value, and a diametrical distance between the modification layers is reduced in a moving direction of the modifying device from the boundary position and/or a frequency of the laser light is reduced.
Public/Granted literature
- US12103111B2 Processing apparatus and processing method Public/Granted day:2024-10-01
Information query
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