Invention Application
- Patent Title: POWER-TAP PASS-THROUGH TO CONNECT A BURIED POWER RAIL TO FRONT-SIDE POWER DISTRIBUTION NETWORK
-
Application No.: US17328236Application Date: 2021-05-24
-
Publication No.: US20220181258A1Publication Date: 2022-06-09
- Inventor: Lars LIEBMANN , Jeffrey SMITH , Daniel CHANEMOUGAME , Paul GUTWIN
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L27/092 ; H01L21/8238 ; H01L29/786 ; H01L29/06 ; H01L29/66 ; H01L29/423

Abstract:
A semiconductor device includes a device plane including an array of cells each including a transistor device. The device plane is formed on a working surface of a substrate and has a front side and a backside opposite the front side. A signal wiring structure is formed on the front side of the device plane. A front-side power distribution network (FSPDN) is positioned on the front side of the device plane. A buried power rail (BPR) is disposed below the device plane on the backside of the device plane. A power tap structure is formed in the device plane. The power tap structure electrically connects the BPR to the FSPDN and electrically connects the BPR to at least one of the transistor devices to provide power to the at least one of the transistor devices.
Public/Granted literature
- US11961802B2 Power-tap pass-through to connect a buried power rail to front-side power distribution network Public/Granted day:2024-04-16
Information query
IPC分类: