Invention Application
- Patent Title: METHOD AND APPARATUS FOR PREDICTING SUBSTRATE IMAGE
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Application No.: US17441729Application Date: 2020-03-26
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Publication No.: US20220187713A1Publication Date: 2022-06-16
- Inventor: Scott Anderson MIDDLEBROOKS , Adrianus Cornelis Matheus KOOPMAN , Markus Gerardus Martinus Maria VAN KRAAIJ , Maxim PISARENCO , Stefan HUNSCHE
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2020/058488 WO 20200326
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G06N3/08 ; G06T7/00

Abstract:
A method for training a machine learning model configured to predict a substrate image corresponding to a printed pattern of a substrate as measured via a metrology tool. The method involves obtaining a training data set including (i) metrology data of the metrology tool used to measure the printed pattern of the substrate, and (ii) a representation of a mask pattern employed for imaging the printed pattern on the substrate; and training, based on the training data set, a machine learning model to predict the substrate image of the substrate as measured by the metrology tool such that a cost function is improved, wherein the cost function includes a relationship between the predicted substrate image and the metrology data.
Information query
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