公开(公告)号：US20230267711A1

公开(公告)日：2023-08-24

申请号：US18015313

申请日：2021-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Scott Anderson MIDDLEBROOKS ,  Maxim PISARENCO ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Coen Adrianus VERSCHUREN

IPC: G06V10/774 ,  G06N3/0464 ,  G06V10/50

CPC classification number: G06V10/774 ,  G06N3/0464 ,  G06V10/50

Abstract: A method and apparatus for selecting patterns from an image such as a design layout. The method includes obtaining an image (e.g., of a target layout) having a plurality of patterns; determining, based on pixel intensities within the image, a metric (e.g., entropy) indicative of an amount of information contained in one or more portions of the image; and selecting, based on the metric, a sub-set of the plurality of patterns from the one or more portions of the image having values of the metric within a specified range. The sub-set of patterns can be provided as training data for training a model associated with a patterning process.

公开(公告)号：US20220260929A1

公开(公告)日：2022-08-18

申请号：US17628668

申请日：2020-07-06

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nikhil MEHTA ,  Maurits VAN DER SCHAAR ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Hugo Augustinus Joseph CRAMER ,  Olger Victor ZWIER ,  Jeroen COTTAAR ,  Patrick WARNAAR

IPC: G03F7/20 ,  G03F1/84 ,  G01N21/956

Abstract: A patterning device for patterning product structures onto a substrate and an associated substrate patterned using such a patterning device. The patterning device includes target patterning elements for patterning at least one target from which a parameter of interest can be inferred. The patterning device includes product patterning elements for patterning the product structures. The target patterning elements and product patterning elements are configured such that the at least one target has at least one boundary which is neither parallel nor perpendicular with respect to the product structures on the substrate.

公开(公告)号：US20190391498A1

公开(公告)日：2019-12-26

申请号：US16561096

申请日：2019-09-05

Applicant: ASML Netherlands B.V.

Inventor： Scott Anderson MIDDLEBROOKS ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Adrianus Cornelis Matheus KOOPMAN ,  Stefan HUNSCHE ,  Willem Marie Julia Marcel COENE

IPC: G03F7/20 ,  G06T7/60 ,  G06T7/12

Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.

公开(公告)号：US20240320528A1

公开(公告)日：2024-09-26

申请号：US18579560

申请日：2022-08-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Patrick Philipp HELFENSTEIN ,  Scott Anderson MIDDLEBROOKS ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Maxim PISARENCO

IPC: G06N7/01

CPC classification number: G06N7/01

Abstract: A method of designing a target includes obtaining a model of an initial dataset, performing a Bayesian optimization using the model which provides an improved model, and performing an optimization of the target design using the improved model.

公开(公告)号：US20240152060A1

公开(公告)日：2024-05-09

申请号：US18282305

申请日：2022-02-17

Applicant: ASML Netherlands B.V.

Inventor： Patrick Philipp HELFENSTEIN ,  Scott Anderson MIDDLEBROOKS ,  Maxim PISARENCO ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Alexander Prasetya KONIJNENBERG

IPC: G03F7/00

CPC classification number: G03F7/705 ,  G03F7/70575 ,  G03F7/70675

Abstract: A method and system for predicting process information (e.g., phase data) using a given input (e.g., intensity) to a parameterized model are described. A latent space of a given input is determined based on dimensional data in a latent space of the parameterized model for a given input to the parameterized model. Further, an optimum latent space is determined by constraining the latent space with prior information (e.g., wavelength) that enables converging to a solution that causes more accurate predictions of the process information. The optimum latent space is used to predict the process information. The given input may be a measured amplitude (e.g., intensity) associated with the complex electric field image. The predicted process information can be complex electric field image having amplitude data and phase data. The parameterized model comprises variational encoder-decoder architecture.

公开(公告)号：US20210286270A1

公开(公告)日：2021-09-16

申请号：US17334574

申请日：2021-05-28

Applicant: ASML Netherlands B.V.

Inventor： Scott Anderson MIDDLEBROOKS ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Maxim PISARENCO

IPC: G03F7/20 ,  G06N3/04 ,  G06N20/00

Abstract: Described herein is a method for quantifying uncertainty in parameterized (e.g., machine learning) model predictions. The method comprises causing a parameterized model to predict multiple posterior distributions from the parameterized model for a given input. The multiple posterior distributions comprise a distribution of distributions. The method comprises determining a variability of the predicted multiple posterior distributions for the given input by sampling from the distribution of distributions; and using the determined variability in the predicted multiple posterior distributions to quantify uncertainty in the parameterized model predictions. The parameterized model comprises encoder-decoder architecture. The method comprises using the determined variability in the predicted multiple posterior distributions to adjust the parameterized model to decrease the uncertainty of the parameterized model for predicting wafer geometry, overlay, and/or other information as part of a semiconductor manufacturing process.

公开(公告)号：US20170345138A1

公开(公告)日：2017-11-30

申请号：US15533614

申请日：2015-11-13

Applicant: ASML Netherlands B.V.

Inventor： Scott Anderson MIDDLEBROOKS ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Maxim PISARENCO ,  Adrianus Cornelis Matheus KOOPMAN ,  Stefan HUNSCHE ,  Willem Marie Julia Marcel COENE

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G06T2207/10061 ,  G06T2207/20068 ,  G06T2207/30148

Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.

公开(公告)号：US20240369944A1

公开(公告)日：2024-11-07

申请号：US18287166

申请日：2022-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Chrysostomos BATISTAKIS ,  Maxim PISARENCO ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Vito Daniele RUTIGLIANI ,  Scott Anderson MIDDLEBROOKS ,  Coen Adrianus VERSCHUREN ,  Niels GEYPEN

IPC: G03F7/00 ,  G06N20/00

Abstract: A method of determining a stochastic metric, the method including: obtaining a trained model having been trained to correlate training optical metrology data to training stochastic metric data, wherein the training optical metrology data includes a plurality of measurement signals relating to distributions of an intensity related parameter across a zero or higher order of diffraction of radiation scattered from a plurality of training structures, and the training stochastic metric data includes stochastic metric values relating to the plurality of training structures, wherein the plurality of training structures have been formed with a variation in one or more dimensions on which the stochastic metric is dependent; obtaining optical metrology data including a distribution of the intensity related parameter across a zero or higher order of diffraction of radiation scattered from a structure; and using the trained model to infer a value of the stochastic metric from the optical metrology data.

公开(公告)号：US20200348605A1

公开(公告)日：2020-11-05

申请号：US16931002

申请日：2020-07-16

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus MATHIJSSEN ,  Stefan HUNSCHE ,  Markus Gerardus Martinus Maria VAN KRAAIJ

IPC: G03F7/20 ,  G03F7/213 ,  G03F7/22

Abstract: Disclosed is an inspection apparatus for use in lithography. It comprises a support for a substrate carrying a plurality of metrology targets; an optical system for illuminating the targets under predetermined illumination conditions and for detecting predetermined portions of radiation diffracted by the targets under the illumination conditions; a processor arranged to calculate from said detected portions of diffracted radiation a measurement of asymmetry for a specific target; and a controller for causing the optical system and processor to measure asymmetry in at least two of said targets which have different known components of positional offset between structures and smaller sub-structures within a layer on the substrate and calculate from the results of said asymmetry measurements a measurement of a performance parameter of the lithographic process for structures of said smaller size. Also disclosed are substrates provided with a plurality of novel metrology targets formed by a lithographic process.

公开(公告)号：US20200348244A1

公开(公告)日：2020-11-05

申请号：US16963905

申请日：2019-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitish KUMAR ,  Richard QUINTANILHA ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Konstantin TSIGUTKIN ,  Willem Marie Julia Marcel COENE

IPC: G01N21/956 ,  G02F1/35 ,  G03F1/84

Abstract: A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.