Invention Application
- Patent Title: INTEGRATED CIRCUIT DEVICE HAVING BACKEND DOUBLE-WALLED CAPACITORS
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Application No.: US17129875Application Date: 2020-12-21
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Publication No.: US20220199760A1Publication Date: 2022-06-23
- Inventor: Abhishek A. SHARMA , Noriyuki SATO , Sudarat LEE , Scott B. CLENDENNING , Sudipto NASKAR , Manish CHANDHOK , Hui Jae YOO , Van H. LE
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L49/02
- IPC: H01L49/02 ; H01L23/522 ; H01L23/528 ; H01G4/10

Abstract:
An integrated circuit (IC) structure having a plurality of backend double-walled capacitors (DWCs) are described. In an example, a first interconnect layer is disposed over a substrate and a second interconnect layer is disposed over the first interconnect layer. In the example, a plurality of DWCs are disposed in the first interconnect layer or the second interconnect layer to provide capacitance to assist the first interconnect layer and the second interconnect layer in providing electrical signal routing and power distribution to one or more devices in the IC structure. In examples, the IC structure includes a logic IC or a coupling substrate.
Information query
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