Invention Application
- Patent Title: THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING THE SAME
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Application No.: US17706426Application Date: 2022-03-28
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Publication No.: US20220223619A1Publication Date: 2022-07-14
- Inventor: WOOSUNG YANG , DONG-SIK LEE , SUNG-MIN HWANG , JOON-SUNG LIM
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2019-0075814 20190625
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L27/11526 ; H01L27/11556 ; H01L23/522 ; H01L23/528 ; H01L21/28 ; H01L29/66 ; H01L27/11519 ; H01L27/11565 ; H01L27/11573

Abstract:
A three-dimensional semiconductor memory device may include horizontal patterns disposed on a peripheral circuit structure and spaced apart from each other, memory structures provided on the horizontal patterns, respectively, each of the memory structures including a three-dimensional arrangement of memory cells. Penetrating insulating patterns and separation structures may isolate the horizontal patterns from one another. Through vias may extend through the penetrating insulating patterns to connect logic circuits of the peripheral circuit structure to the memory structure.
Public/Granted literature
- US11930639B2 Three-dimensional semiconductor memory device and method of fabricating the same Public/Granted day:2024-03-12
Information query
IPC分类: