Invention Application
- Patent Title: METHOD AND SYSTEM FOR MIXED MODE WAFER INSPECTION
-
Application No.: US17713017Application Date: 2022-04-04
-
Publication No.: US20220230293A1Publication Date: 2022-07-21
- Inventor: Jason Z. Lin , Allen Park , Ellis Chang , Richard Wallingford , Songnian Rong , Chetana Bhaskar
- Applicant: KLA Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA Corporation
- Current Assignee: KLA Corporation
- Current Assignee Address: US CA Milpitas
- Main IPC: G06T7/00
- IPC: G06T7/00

Abstract:
Mixed-mode includes receiving inspection results including one or more images of a selected region of the wafer, the one or more images include one or more wafer die including a set of repeating blocks, the set of repeating blocks a set of repeating cells. In addition, mixed-mode inspection includes adjusting a pixel size of the one or more images to map each cell, block and die to an integer number of pixels. Further, mixed-mode inspection includes comparing a first wafer die to a second wafer die to identify an occurrence of one or more defects in the first or second wafer die, comparing a first block to a second block to identify an occurrence of one or more defects in the first or second blocks and comparing a first cell to a second cell to identify an occurrence of one or more defects in the first or second cells.
Information query