Invention Application
- Patent Title: MOVEABLE EDGE RINGS WITH REDUCED CAPACITANCE VARIATION FOR SUBSTRATE PROCESSING SYSTEMS
-
Application No.: US17632066Application Date: 2020-08-04
-
Publication No.: US20220254612A1Publication Date: 2022-08-11
- Inventor: Christopher KIMBALL , Hema Swaroop MOPIDEVI , Saravanapriyan SRIRAMAN , Tom A. KAMP , Darrell EHRLICH , Anthony CONTRERAS , Chiara Helena Catherina MACPHERSON
- Applicant: LAM RESEARCH CORPORATION
- Applicant Address: US CA Fremont
- Assignee: LAM RESEARCH CORPORATION
- Current Assignee: LAM RESEARCH CORPORATION
- Current Assignee Address: US CA Fremont
- International Application: PCT/US2020/044816 WO 20200804
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/687
Abstract:
A moveable edge ring system for a plasma processing system includes a top edge ring and a first edge ring arranged below the top edge ring. A second edge ring is made of conductive material and includes an upper portion, a middle portion and a lower portion. The top edge ring and the second edge ring are configured to move in a vertical direction relative to a substrate support and the first edge ring when biased upwardly by a lift pin. The second edge ring is arranged below the top edge ring and radially outside of the first edge ring.
Information query
