公开(公告)号：US20220254612A1

公开(公告)日：2022-08-11

申请号：US17632066

申请日：2020-08-04

Applicant: LAM RESEARCH CORPORATION

Inventor： Christopher KIMBALL ,  Hema Swaroop MOPIDEVI ,  Saravanapriyan SRIRAMAN ,  Tom A. KAMP ,  Darrell EHRLICH ,  Anthony CONTRERAS ,  Chiara Helena Catherina MACPHERSON

IPC: H01J37/32 ,  H01L21/687

Abstract: A moveable edge ring system for a plasma processing system includes a top edge ring and a first edge ring arranged below the top edge ring. A second edge ring is made of conductive material and includes an upper portion, a middle portion and a lower portion. The top edge ring and the second edge ring are configured to move in a vertical direction relative to a substrate support and the first edge ring when biased upwardly by a lift pin. The second edge ring is arranged below the top edge ring and radially outside of the first edge ring.