Invention Application
- Patent Title: CLEANING AND POLISHING FLUID AND METHOD OF USING
-
Application No.: US17624632Application Date: 2020-07-08
-
Publication No.: US20220275309A1Publication Date: 2022-09-01
- Inventor: Feng Bai , Sarah L. Hagen , Matthew P. Guay
- Applicant: 3M INNOVATIVE PROPERTIES COMPANY
- Applicant Address: US MN St. Paul
- Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee Address: US MN St. Paul
- International Application: PCT/IB2020/056428 WO 20200708
- Main IPC: C11D3/37
- IPC: C11D3/37 ; C11D3/12 ; C11D11/00
Abstract:
Cleaning and polishing fluids are described. In particular, cleaning and polishing fluids that include water, polymer, and a silicate are described. These cleaning and polishing fluids exhibit good performance, particularly when used with an abrasive pad in a cleaning process.
Information query
