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公开(公告)号：US20220275309A1
公开(公告)日：2022-09-01
申请号：US17624632
申请日：2020-07-08
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： Feng Bai , Sarah L. Hagen , Matthew P. Guay
Abstract: Cleaning and polishing fluids are described. In particular, cleaning and polishing fluids that include water, polymer, and a silicate are described. These cleaning and polishing fluids exhibit good performance, particularly when used with an abrasive pad in a cleaning process.
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