Invention Application
- Patent Title: COMPOSITION AND METHOD FOR TREATING SUBSTRATE
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Application No.: US17825722Application Date: 2022-05-26
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Publication No.: US20220282156A1Publication Date: 2022-09-08
- Inventor: Moe NARITA , Atsushi Mizutani
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2020-011382 20200128
- Main IPC: C09K13/06
- IPC: C09K13/06 ; H01L21/02 ; H01L21/3213
Abstract:
A composition contains a periodic acid compound selected from the group consisting of a periodic acid and a salt thereof, an amine compound that is a specific compound represented by Formula (1) or a salt thereof, and water.
Information query
