Invention Application
- Patent Title: DENTAL PHOTOCURABLE COMPOSITION CONTAINING HIGH SOLUBLE PHOTOACID GENERATOR
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Application No.: US17201165Application Date: 2021-03-15
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Publication No.: US20220287920A1Publication Date: 2022-09-15
- Inventor: Kenzo YAMAMOTO , Daisuke HARA , Shunsuke MIYATA
- Applicant: SHOFU INC.
- Applicant Address: JP Kyoto
- Assignee: SHOFU INC.
- Current Assignee: SHOFU INC.
- Current Assignee Address: JP Kyoto
- Priority: JP2021-40033 20210312,JP2021-40037 20210312,JP2021-40039 20210312,JP2021-40040 20210312
- Main IPC: A61K6/62
- IPC: A61K6/62 ; A61K6/887
Abstract:
To provide a dental photocurable composition which can exhibit excellent mechanical characteristics even after returning from a low temperature to room temperature.
To provide a dental photocurable composition, comprising (A) polymerizable monomer, (B) photosensitizer, (C) photoacid generator and (D) photopolymerization accelerator and the (C) photoacid generator may include only (C-1) iodonium salt-based compound of an anion having log S of −4 or less.
To provide a dental photocurable composition, comprising (A) polymerizable monomer, (B) photosensitizer, (C) photoacid generator and (D) photopolymerization accelerator and the (C) photoacid generator may include only (C-1) iodonium salt-based compound of an anion having log S of −4 or less.
Public/Granted literature
- US11622917B2 Dental photocurable composition containing high soluble photoacid generator Public/Granted day:2023-04-11
Information query
