发明申请
- 专利标题： CLEANING LIQUID, METHOD OF CLEANING, AND METHOD OF MANUFACTURING SEMICONDUCTOR WAFER
-
申请号： US17829682申请日： 2022-06-01
-
公开(公告)号： US20220298456A1公开(公告)日： 2022-09-22
- 发明人: Longjie AN , Tomohiro KUSANO , Yukako ONO , Kan TAKESHITA , Kenichi KIYONO
- 申请人： Mitsubishi Chemical Corporation
- 申请人地址： JP Tokyo
- 专利权人： Mitsubishi Chemical Corporation
- 当前专利权人： Mitsubishi Chemical Corporation
- 当前专利权人地址： JP Tokyo
- 优先权： JP2019-218699 20191203
- 主分类号： C11D7/36
- IPC分类号： C11D7/36 ; C11D7/08 ; C11D7/26 ; C11D7/32 ; C11D11/00 ; C09G1/02 ; H01L21/306
摘要：
The present invention relates to a cleaning liquid on a silicon oxide film and/or a silicon nitride film, and the cleaning liquid contains (i) at least one compound selected from the group consisting of a compound represented by the formula (1), a compound represented by formula (2), a compound represented by formula (3), and a compound represented by the formula (4); and (ii) a reducing agent; in the above formulas, R1 to R12 and n are the same as the definitions described in the description.
信息查询
