Nanosheets 21 to 24 are formed in line in this order in the X direction, and nanosheets 25 to 28 are formed in line in this order in the X direction. Faces of the nanosheets 21, 23, 25, and 27 on the first side in the X direction are exposed from gate interconnects 30, 33, 35, and 36, respectively. Faces of the nanosheets 22, 24, 26, and 28 on the second side in the X direction are exposed from gate interconnects 33, 34, 36, and 39, respectively.