Invention Application
- Patent Title: PROCESSING LIQUID NOZZLE AND CLEANING APPARATUS
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Application No.: US17763371Application Date: 2020-09-14
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Publication No.: US20220371041A1Publication Date: 2022-11-24
- Inventor: Daisuke GOTO , Katsuhiro MORIKAWA , Takahiro KOGA
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Priority: JP2019-174136 20190925
- International Application: PCT/JP2020/034618 WO 20200914
- Main IPC: B05B17/06
- IPC: B05B17/06 ; B08B3/02 ; B08B3/12 ; B08B3/08 ; B08B5/04 ; B08B5/02 ; B08B13/00

Abstract:
A processing liquid nozzle according to an aspect of the present invention comprises an ultrasonic application part (60), a first supply flow path (71), a discharge flow path (72), and a second supply flow path (73). The ultrasonic application part (60) has a vibrator (61) for generating ultrasonic waves, and a vibrating body (62) joined to the vibrator (61). The first supply flow path (71) supplies a first liquid (L1) to a position contacting the vibrating body (62) of the ultrasonic application part (60). The discharge flow path (72) supplies the first liquid (L1), to which ultrasonic waves have been applied by the ultrasonic application part (60), to a discharge port (74). The second supply flow path (73) is connected to the discharge flow path (72) on the downstream side from the ultrasonic application part (60), and supplies a second liquid (L2) to the discharge flow path (72).
Public/Granted literature
- US12109580B2 Processing liquid nozzle and cleaning apparatus Public/Granted day:2024-10-08
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