公开(公告)号：US20150235888A1

公开(公告)日：2015-08-20

申请号：US14625201

申请日：2015-02-18

Applicant: TOKYO ELECTRON LIMITED

Inventor： Naruaki IIDA ,  Katsuhiro MORIKAWA

IPC: H01L21/68 ,  H01L21/687 ,  G05B19/418 ,  H01L21/677

CPC classification number: G05B19/4189 ,  G05B2219/45031 ,  H01L21/67766 ,  H01L21/681 ,  H01L21/68707 ,  Y02P90/28

Abstract: A substrate processing apparatus includes: first and second places in which a substrate can be placed; a substrate transfer device having a substrate holder that holds the substrate to transfer the substrate between the first and second places; and a substrate position measuring unit that detects a position of the substrate held by the substrate holder. The substrate position measuring unit, disposed independently of the substrate transfer device, is arranged at a position where the substrate held by the substrate holder of the substrate transfer device can be placed.

Abstract translation: 基板处理装置包括：可以放置基板的第一和第二位置; 衬底传送装置，具有保持所述衬底以在所述第一和第二位置之间传送所述衬底的衬底保持器; 以及基板位置测量单元，其检测由所述基板保持器保持的所述基板的位置。 基板位置测量单元独立于基板传送装置设置在可以放置基板传送装置的基板保持器的基板的位置。

公开(公告)号：US20220371041A1

公开(公告)日：2022-11-24

申请号：US17763371

申请日：2020-09-14

Applicant: Tokyo Electron Limited

Inventor： Daisuke GOTO ,  Katsuhiro MORIKAWA ,  Takahiro KOGA

IPC: B05B17/06 ,  B08B3/02 ,  B08B3/12 ,  B08B3/08 ,  B08B5/04 ,  B08B5/02 ,  B08B13/00

Abstract: A processing liquid nozzle according to an aspect of the present invention comprises an ultrasonic application part (60), a first supply flow path (71), a discharge flow path (72), and a second supply flow path (73). The ultrasonic application part (60) has a vibrator (61) for generating ultrasonic waves, and a vibrating body (62) joined to the vibrator (61). The first supply flow path (71) supplies a first liquid (L1) to a position contacting the vibrating body (62) of the ultrasonic application part (60). The discharge flow path (72) supplies the first liquid (L1), to which ultrasonic waves have been applied by the ultrasonic application part (60), to a discharge port (74). The second supply flow path (73) is connected to the discharge flow path (72) on the downstream side from the ultrasonic application part (60), and supplies a second liquid (L2) to the discharge flow path (72).

公开(公告)号：US20160172225A1

公开(公告)日：2016-06-16

申请号：US14649673

申请日：2013-12-10

Applicant: TOKYO ELECTRON LIMITED

Inventor： Katsuhiro MORIKAWA ,  Ikuo SUNAKA ,  Suguru ENOKIDA

IPC: H01L21/677 ,  H01L21/67

CPC classification number: H01L21/67772 ,  H01L21/67253 ,  H01L21/67766 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67778

Abstract: A substrate processing apparatus includes: a load port into and out of which the transport container is carried; and an apparatus controller that controls operations in the load port. The apparatus controller includes a storage unit that stores transition data of parameter values sent from outside based on a transport container identification code. The transition data of the parameter values each comprises a usage count of the transport container and a corresponding parameter value that quantifies a result of at least one of an operation performed to remove the lid after the transport container is carried into the load port and an operation performed to carry the container out of the load port. The apparatus controller further includes a determination unit that determines, after a transport container is carried into the load port, presence or absence of an abnormality in that transport container based on a parameter value associated with at least one of carrying-in or carrying-out of that transport container, and past transition data of parameter values associated with that transport container.

Abstract translation: 一种基板处理装置，包括：输送出搬运集装箱的装载口; 以及控制负载端口中的操作的装置控制器。 设备控制器包括存储单元，其存储基于运送容器识别码从外部发送的参数值的转换数据。 参数值的过渡数据各自包括运输容器的使用计数和相应的参数值，其量化在将运输容器运送到装载口中之后移除盖子的操作中的至少一个的结果，以及操作 执行将容器从负载端口运出。 设备控制器还包括一个确定单元，该确定单元根据与至少一个进入或执行的参数值，在将运送容器运送到装载端口中之后存在或不存在运输容器中的异常 的运输集装箱的过渡数据和与该运输集装箱相关联的参数值的过渡数据。

公开(公告)号：US20220130691A1

公开(公告)日：2022-04-28

申请号：US17510234

申请日：2021-10-25

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kouzou TACHIBANA ,  Katsuhiro MORIKAWA ,  Kouichi MIZUNAGA ,  Masami AKIMOTO ,  Kousuke NEGISHI

IPC: H01L21/67 ,  H01L21/683

Abstract: A substrate processing method of performing liquid processing on a substrate in a substrate processing apparatus, which includes a substrate table configured to suction the substrate, a heater configured to heat the substrate table, and a processing liquid nozzle configured to supply a processing liquid to the substrate suctioned to the substrate table, includes: a suctioning process of suctioning the substrate by the substrate table when there is no temperature difference between the substrate and the substrate table or when a temperature difference between the substrate and the substrate is within a predetermined range; and after the suctioning process, a processing liquid supply process of supplying the processing liquid from the processing liquid nozzle to the substrate suctioned to the substrate table heated by the heater.

公开(公告)号：US20200172351A1

公开(公告)日：2020-06-04

申请号：US16629783

申请日：2018-06-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Katsuhiro MORIKAWA

IPC: B65G49/07 ,  H01L21/677 ,  H01L21/68

Abstract: A substrate transfer device according to an embodiment includes: a holding part configured to hold a substrate having a pattern formed on a front surface thereof; and a supply part configured to supply an inert gas, which locally keeps the front surface of the substrate held by the holding part in a low oxygen state, to the front surface of the substrate.

公开(公告)号：US20150300960A1

公开(公告)日：2015-10-22

申请号：US14649615

申请日：2013-12-05

Applicant: TOKYO ELECTRON LIMITED

Inventor： Katsuhiro MORIKAWA ,  Ikuo SUNAKA

IPC: G01N21/88 ,  H01L21/673

CPC classification number: G01N21/88 ,  H01L21/67265 ,  H01L21/67326 ,  H01L21/67346 ,  H01L21/67733 ,  H01L21/67772 ,  H01L21/67775

Abstract: A substrate processing apparatus includes: a load port into which the transport container is carried; a detecting unit that detects storage condition of the substrates which are contained in the transport container, which has been carried into the load port and the lid of which has been removed; a processing unit that processes the substrates removed from the transport container having been carried into the load port; and a control unit. The control unit performs a first step that detects storage condition of the substrates, which are contained in the transport container having been carried into the load port, before the substrates are removed from the transport container to be delivered to the processing unit; a second step that detects storage condition of the substrates, which have been processed in the processing unit and returned to the original transport container, before closing the lid; and a third step that judges whether or not the transport container has an abnormality based on results of the first and second steps.

Abstract translation: 一种基板处理装置，包括：承载运输容器的装载口; 检测单元，其检测已经被运送到所述装载端口中并且其盖被去除的运送容器中容纳的所述基板的储存状态; 一个处理单元，处理已经运送到装载口中的从运输容器移除的基板; 和控制单元。 控制单元执行第一步骤，在将基板从运送容器移走以被传送到处理单元之前，检测包含在已经运送到装载口中的运输容器中的基板的储存状态; 第二步骤，在关闭盖子之前检测在处理单元中已经处理并返回到原始运输容器的基板的储存状态; 以及第三步骤，基于第一和第二步骤的结果来判断运输集装箱是否具有异常。