Invention Application
- Patent Title: SEMICONDUCTOR MANUFACTURING APPARATUS AND TEMPERATURE CONTROL METHOD
-
Application No.: US17826805Application Date: 2022-05-27
-
Publication No.: US20220390288A1Publication Date: 2022-12-08
- Inventor: Tadashi ENOMOTO , Tsutomu SUGAWARA
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Priority: JP2021-093048 20210602
- Main IPC: G01K1/14
- IPC: G01K1/14 ; H05B1/02 ; G01K13/024
Abstract:
A semiconductor manufacturing apparatus includes: a gas introduction pipe connected to a processing container of the semiconductor manufacturing apparatus in order to introduce a gas into the processing container; and a temperature sensor provided in the gas introduction pipe in order to measure a temperature of a gas in the gas introduction pipe.
Information query
