Invention Application
- Patent Title: CONCENTRATION SENSOR FOR PRECURSOR DELIVERY SYSTEM
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Application No.: US17365906Application Date: 2021-07-01
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Publication No.: US20230003704A1Publication Date: 2023-01-05
- Inventor: Vivek B. Shah , Varoujan Chakarian , Upendra Ummethala
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: G01N33/00
- IPC: G01N33/00 ; C23C16/52 ; G01N11/02 ; G01F1/74

Abstract:
A concentration sensor assembly can include a vaporization chamber having a compound. The concentration sensor assembly may include a first flow path coupled to the vaporization chamber. The first flow path may direct a first gas to the vaporization chamber. A second flow path can direct a second gas out of the vaporization chamber. The second gas can include the compound and the first gas. A first sensor is disposed along the first flow path. The first sensor measures first data indicative of a first mass flow rate of the first gas. A second sensor is disposed along the second flow path. The second sensor measure second data indicative of a second mass flow rate of the second gas. A computing device may determine a concentration of the vaporizable substance within the second gas based on the first data and the second data.
Public/Granted literature
- US11808746B2 Concentration sensor for precursor delivery system Public/Granted day:2023-11-07
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