-
公开(公告)号：US11808746B2
公开(公告)日：2023-11-07
申请号：US17365906
申请日：2021-07-01
Applicant: Applied Materials, Inc.
Inventor： Vivek B. Shah , Varoujan Chakarian , Upendra Ummethala
CPC classification number: G01N33/0016 , C23C16/52 , G01F1/74 , G01N11/02 , G01N33/0073
Abstract: A concentration sensor assembly can include a vaporization chamber having a compound. The concentration sensor assembly may include a first flow path coupled to the vaporization chamber. The first flow path may direct a first gas to the vaporization chamber. A second flow path can direct a second gas out of the vaporization chamber. The second gas can include the compound and the first gas. A first sensor is disposed along the first flow path. The first sensor measures first data indicative of a first mass flow rate of the first gas. A second sensor is disposed along the second flow path. The second sensor measure second data indicative of a second mass flow rate of the second gas. A computing device may determine a concentration of the vaporizable substance within the second gas based on the first data and the second data.
-
公开(公告)号：US20230298872A1
公开(公告)日：2023-09-21
申请号：US17696791
申请日：2022-03-16
Applicant: Applied Materials, Inc.
Inventor： Jeffrey Yat Shan Au , Joshua Thomas Maher , Varoujan Chakarian , Sidharth Bhatia , Patrick Tae , Zhaozhao Zhu , Blake W. Erickson
IPC: H01J37/32
CPC classification number: H01J37/32972 , H01J37/32926 , H01J2237/334
Abstract: A method includes receiving, by a processing device, first sensor data indicating a state of a wall corresponding to a first processing chamber. The first sensor data includes optical spectral data. The method further includes determining, by the processing device, a first value based on the first sensor data. The first value corresponds to a first amount of a product disposed along a surface of the wall at a first time. The method further includes determining, by the processing device, a first update to a first process operation associated with the first processing chamber based on the first value. The method further includes performing, by the processing device, one or more of (i) preparing a notification indicating the first update for presentation on a graphical user interface (GUI), or (ii) causing performance of the first process operation in accordance with the first update.
-
公开(公告)号：US20250061557A1
公开(公告)日：2025-02-20
申请号：US18234713
申请日：2023-08-16
Applicant: Applied Materials, Inc.
Inventor： Varoujan Chakarian
IPC: G06T7/00 , G06V10/147
Abstract: A method includes grouping signal traces based on signal trace characteristics. The method includes generating an image, a first dimension of the image corresponding to the signal traces, and a second dimension of the image corresponding to time values, where a visual indicator corresponds to a signal trace characteristic of a signal trace at a time value, the signal trace corresponds to a row or column of the first dimension, and the time value corresponds the second dimension. The method includes detecting a defect in operation of components of manufacturing equipment associated with the signal traces based on a deviation of visual indicators in a row or column from a visual indicator of a respective group of visual indicators associated with signal traces with similar signal trace characteristics. The method includes classifying the defect based on a signal trace corresponding to the row or column of the image.
-
公开(公告)号：US20240429077A1
公开(公告)日：2024-12-26
申请号：US18821569
申请日：2024-08-30
Applicant: APPLIED MATERIALS, INC.
Inventor： Varoujan Chakarian , Blake W. Erickson
Abstract: The disclosure describes apparatus and method for detecting an endpoint in plasma-assisted wafer processing in a chamber. A fiber array comprising a plurality of fibers collects optical emission light from the chamber during the plasma-assisted wafer processing. The fiber array is split into two or more groups of fibers, each group carrying a portion of the light to a segment of a photodetector. Each segment of photodetector has a corresponding narrowband optical filter designed for a specific range of wavelengths. A computer processor analyzes detected signals from the plurality of segments of the photodetector, and determines, based on the analysis of the detected signals, an endpoint of the plasma-assisted wafer processing as indicated by the presence or the absence of the one or more chemical species in the chamber. The photodetector can be based on photomultiplier tube (PMT) array or based on photodiodes (e.g., avalanche photodiodes (APDs)).
-
公开(公告)号：US12080574B2
公开(公告)日：2024-09-03
申请号：US16932630
申请日：2020-07-17
Applicant: APPLIED MATERIALS, INC.
Inventor： Varoujan Chakarian , Blake W Erickson
CPC classification number: H01L21/67253 , G01J3/0218 , G01J3/32 , G01J3/36 , G01N33/0009 , H01J37/32963 , H01J37/32972 , H01J37/32981 , H01L22/26 , H01J2237/2445
Abstract: The disclosure describes apparatus and method for detecting an endpoint in plasma-assisted wafer processing in a chamber. A fiber array comprising a plurality of fibers collects optical emission light from the chamber during the plasma-assisted wafer processing. The fiber array is split into two or more groups of fibers, each group carrying a portion of the light to a segment of a photodetector. Each segment of photodetector has a corresponding narrowband optical filter designed for a specific range of wavelengths. A computer processor analyzes detected signals from the plurality of segments of the photodetector, and determines, based on the analysis of the detected signals, an endpoint of the plasma-assisted wafer processing as indicated by the presence or the absence of the one or more chemical species in the chamber. The photodetector can be based on photomultiplier tube (PMT) array or based on photodiodes (e.g., avalanche photodiodes (APDs)).
-
Patent Agency Ranking
公开(公告)号：US20240019410A1
公开(公告)日：2024-01-18
申请号：US18373732
申请日：2023-09-27
Applicant: Applied Materials, Inc.
Inventor： Vivek B. Shah , Varoujan Chakarian , Upendra Ummethala
CPC classification number: G01N33/0016 , C23C16/52 , G01N33/0073 , G01F1/74 , G01N11/02
Abstract: First sensor data indicative of a first mass flow rate of a first gas flowing to a vaporization chamber is received. The vaporization chamber includes a compound and is to transition the compound into a gaseous state. Second sensor data indicative of a second mass flow rate of a second gas including the compound and the first gas flowing out of the vaporization chamber is received. Third sensor data indicative of a third mass flow rate of the compound into the vaporization chamber is received. The first sensor data, the second sensor data, and the third sensor data is processed using a trained machine learning model to determine an estimated concentration of the compound within the second gas. At least one of a) modifying a flow rate of the first gas or b) providing the predicted concentration for display by a graphical user interface (GUI) is performed.
-
公开(公告)号：US20240420975A1
公开(公告)日：2024-12-19
申请号：US18821843
申请日：2024-08-30
Applicant: APPLIED MATERIALS, INC.
Inventor： Varoujan Chakarian , Blake W Erickson
Abstract: The disclosure describes apparatus and method for detecting an endpoint in plasma-assisted wafer processing in a chamber. A fiber array comprising a plurality of fibers collects optical emission light from the chamber during the plasma-assisted wafer processing. The fiber array is split into two or more sub-arrays of fibers, each group carrying a portion of the light to a segment of a photodetector. Each segment of photodetector has a corresponding narrowband optical filter designed for a specific range of wavelengths. A computer processor analyzes detected signals from the plurality of segments of the photodetector, and determines, based on the analysis of the detected signals, an endpoint of the plasma-assisted wafer processing as indicated by the presence or the absence of the one or more chemical species in the chamber. The photodetector can be based on photomultiplier tubes (PMT), specifically multi-anode PMT.
-
公开(公告)号：US20230295799A1
公开(公告)日：2023-09-21
申请号：US17696794
申请日：2022-03-16
Applicant: Applied Materials, Inc.
Inventor： Jeffrey Yat Shan Au , Sidharth Bhatia , Zhaozhao Zhu , Nicholas Ryan Pica , Varoujan Chakarian , Chenfei Hu
CPC classification number: C23C16/4401 , G01N21/01 , C23C16/52 , G01N21/94 , G01N2021/0181 , G01N2021/8416
Abstract: A method includes receiving, by a processing device, first data from an optical sensor of a processing chamber. The method further includes processing the first data to obtain second data. The second data includes an indication of a condition of a coating on an interior surface of the processing chamber. The method further includes generating an indication of performance of a processing operation of the processing chamber in view of the second data. The method further includes causing performance of a corrective action in view of the indication of performance of the processing chamber.
-
公开(公告)号：US20230003704A1
公开(公告)日：2023-01-05
申请号：US17365906
申请日：2021-07-01
Applicant: Applied Materials, Inc.
Inventor： Vivek B. Shah , Varoujan Chakarian , Upendra Ummethala
Abstract: A concentration sensor assembly can include a vaporization chamber having a compound. The concentration sensor assembly may include a first flow path coupled to the vaporization chamber. The first flow path may direct a first gas to the vaporization chamber. A second flow path can direct a second gas out of the vaporization chamber. The second gas can include the compound and the first gas. A first sensor is disposed along the first flow path. The first sensor measures first data indicative of a first mass flow rate of the first gas. A second sensor is disposed along the second flow path. The second sensor measure second data indicative of a second mass flow rate of the second gas. A computing device may determine a concentration of the vaporizable substance within the second gas based on the first data and the second data.
-
公开(公告)号：US20220020617A1
公开(公告)日：2022-01-20
申请号：US16932630
申请日：2020-07-17
Applicant: APPLIED MATERIALS, INC.
Inventor： Varoujan Chakarian , Blake W. Erickson
Abstract: The disclosure describes apparatus and method for detecting an endpoint in plasma-assisted wafer processing in a chamber. A fiber array comprising a plurality of fibers collects optical emission light from the chamber during the plasma-assisted wafer processing. The fiber array is split into two or more groups of fibers, each group carrying a portion of the light to a segment of a photodetector. Each segment of photodetector has a corresponding narrowband optical filter designed for a specific range of wavelengths. A computer processor analyzes detected signals from the plurality of segments of the photodetector, and determines, based on the analysis of the detected signals, an endpoint of the plasma-assisted wafer processing as indicated by the presence or the absence of the one or more chemical species in the chamber. The photodetector can be based on photomultiplier tube (PMT) array or based on photodiodes (e.g., avalanche photodiodes (APDs)).
-
-
-
-
-
-
-
-
-
Search Results
10
records
(took 0.03 seconds)
