公开(公告)号：US20240019410A1

公开(公告)日：2024-01-18

申请号：US18373732

申请日：2023-09-27

Applicant: Applied Materials, Inc.

Inventor： Vivek B. Shah ,  Varoujan Chakarian ,  Upendra Ummethala

IPC: G01N33/00 ,  C23C16/52 ,  G01F1/74 ,  G01N11/02

CPC classification number: G01N33/0016 ,  C23C16/52 ,  G01N33/0073 ,  G01F1/74 ,  G01N11/02

Abstract: First sensor data indicative of a first mass flow rate of a first gas flowing to a vaporization chamber is received. The vaporization chamber includes a compound and is to transition the compound into a gaseous state. Second sensor data indicative of a second mass flow rate of a second gas including the compound and the first gas flowing out of the vaporization chamber is received. Third sensor data indicative of a third mass flow rate of the compound into the vaporization chamber is received. The first sensor data, the second sensor data, and the third sensor data is processed using a trained machine learning model to determine an estimated concentration of the compound within the second gas. At least one of a) modifying a flow rate of the first gas or b) providing the predicted concentration for display by a graphical user interface (GUI) is performed.

公开(公告)号：US20230008072A1

公开(公告)日：2023-01-12

申请号：US17857630

申请日：2022-07-05

Applicant: Applied Materials, Inc.

Inventor： Vivek B. Shah ,  Chunlei Zhang

IPC: H01L21/677 ,  H01L21/67

Abstract: Disclosed herein are embodiments of a transfer chamber robot and methods of using the same. In one embodiment, a process tool for an electronic device manufacturing system comprises a transfer chamber, process chamber coupled to the transfer chamber, and a transfer chamber robot. The transfer chamber robot is configured to transfer substrates to and from the process chamber, and comprises a sensor configured to take measurements inside the process chamber.

公开(公告)号：US20230003704A1

公开(公告)日：2023-01-05

申请号：US17365906

申请日：2021-07-01

Applicant: Applied Materials, Inc.

Inventor： Vivek B. Shah ,  Varoujan Chakarian ,  Upendra Ummethala

IPC: G01N33/00 ,  C23C16/52 ,  G01N11/02 ,  G01F1/74

Abstract: A concentration sensor assembly can include a vaporization chamber having a compound. The concentration sensor assembly may include a first flow path coupled to the vaporization chamber. The first flow path may direct a first gas to the vaporization chamber. A second flow path can direct a second gas out of the vaporization chamber. The second gas can include the compound and the first gas. A first sensor is disposed along the first flow path. The first sensor measures first data indicative of a first mass flow rate of the first gas. A second sensor is disposed along the second flow path. The second sensor measure second data indicative of a second mass flow rate of the second gas. A computing device may determine a concentration of the vaporizable substance within the second gas based on the first data and the second data.

公开(公告)号：US12057333B2

公开(公告)日：2024-08-06

申请号：US17466403

申请日：2021-09-03

Applicant: Applied Materials, Inc.

Inventor： Kenneth Brian Doering ,  Vivek B. Shah ,  Ashutosh Agarwal ,  Sanjeev Baluja ,  Shrihari Sampathkumar ,  Chunlei Zhang

IPC: H01L21/67 ,  H01L21/66

CPC classification number: H01L21/67248 ,  H01L22/12 ,  H01L22/30 ,  H01L21/67103

Abstract: Metrology slot plates, processing chamber lids and processing chambers having metrology slot plates are described. Each of the metrology slot plates independently comprises one or more of a plate blank, a reflectometer, a capacitance sensor, a gas flow meter, a manometer, a pyrometer, a distance sensor (laser) or an emissometer.

公开(公告)号：US11515191B2

公开(公告)日：2022-11-29

申请号：US16598665

申请日：2019-10-10

Applicant: Applied Materials, Inc.

Inventor： Vivek B. Shah ,  Bhaskar Kumar ,  Ganesh Balasubramanian

IPC: H01L21/683 ,  H05B1/02 ,  H01L21/67

Abstract: Embodiments disclosed herein may include a heater pedestal. In an embodiment, the heater pedestal may comprise a heater pedestal body and a conductive mesh embedded in the heater pedestal. In an embodiment, the conductive mesh is electrically coupled to a voltage source In an embodiment, the heater pedestal may further comprise a support surface on the heater pedestal body. In an embodiment, the support surface comprises a plurality of pillars extending out from the heater pedestal body and arranged in concentric rings. In an embodiment pillars in an outermost concentric ring have a height that is greater than a height of pillars in an innermost concentric ring.

公开(公告)号：US20210351020A1

公开(公告)日：2021-11-11

申请号：US17381162

申请日：2021-07-20

Applicant: Applied Materials, Inc.

Inventor： Vivek B. Shah ,  Vinayak Vishwanath Hassan ,  Bhaskar Kumar ,  Ganesh Balasubramanian

IPC: H01J37/32

Abstract: Apparatus and methods for generating a flow of radicals are provided. An ion blocker is positioned a distance from a faceplate of a remote plasma source. The ion blocker has openings to allow the plasma to flow through. The ion blocker is polarized relative to a showerhead positioned on an opposite side of the ion blocker so that there are substantially no plasma gas ions passing through the showerhead.

公开(公告)号：US11808746B2

公开(公告)日：2023-11-07

申请号：US17365906

申请日：2021-07-01

Applicant: Applied Materials, Inc.

Inventor： Vivek B. Shah ,  Varoujan Chakarian ,  Upendra Ummethala

IPC: G01N33/00 ,  C23C16/52 ,  G01F1/74 ,  G01N11/02

CPC classification number: G01N33/0016 ,  C23C16/52 ,  G01F1/74 ,  G01N11/02 ,  G01N33/0073

Abstract: A concentration sensor assembly can include a vaporization chamber having a compound. The concentration sensor assembly may include a first flow path coupled to the vaporization chamber. The first flow path may direct a first gas to the vaporization chamber. A second flow path can direct a second gas out of the vaporization chamber. The second gas can include the compound and the first gas. A first sensor is disposed along the first flow path. The first sensor measures first data indicative of a first mass flow rate of the first gas. A second sensor is disposed along the second flow path. The second sensor measure second data indicative of a second mass flow rate of the second gas. A computing device may determine a concentration of the vaporizable substance within the second gas based on the first data and the second data.

公开(公告)号：US20230089982A1

公开(公告)日：2023-03-23

申请号：US17903581

申请日：2022-09-06

Applicant: Applied Materials, Inc.

Inventor： Phillip Criminale ,  Andrew Myles ,  Chunlei Zhang ,  Vivek B. Shah ,  Upendra Ummethala

IPC: H01L21/687 ,  H01L21/67 ,  B65G47/90 ,  G06N3/08

Abstract: An electronic device manufacturing system includes a transfer chamber, a tool station situated within the transfer chamber, a process chamber coupled to the transfer chamber, and a transfer chamber robot. The transfer chamber robot is configured to transfer substrates to and from the process chamber. The transfer chamber robot is further configured to be coupled to a sensor tool comprising one or more sensors configured to take measurements inside the process chamber. The sensor tool is retrievable from the tool station by an end effector of the transfer chamber robot.

公开(公告)号：US20230076170A1

公开(公告)日：2023-03-09

申请号：US17466403

申请日：2021-09-03

Applicant: Applied Materials, Inc.

Inventor： Kenneth Brian Doering ,  Vivek B. Shah ,  Ashutosh Agarwal ,  Sanjeev Baluja ,  Shrihari Sampathkumar ,  Chunlei Zhang

IPC: H01L21/67 ,  H01L21/66

Abstract: Metrology slot plates, processing chamber lids and processing chambers having metrology slot plates are described. Each of the metrology slot plates independently comprises one or more of a plate blank, a reflectometer, a capacitance sensor, a gas flow meter, a manometer, a pyrometer, a distance sensor (laser) or an emissometer.

公开(公告)号：US20200035467A1

公开(公告)日：2020-01-30

申请号：US16523241

申请日：2019-07-26

Applicant: Applied Materials, Inc.

Inventor： Vivek B. Shah ,  Vinayak Vishwanath Hassan ,  Bhaskar Kumar ,  Ganesh Balasubramanian

IPC: H01J37/32

Abstract: Apparatus and methods for generating a flow of radicals are provided. An ion blocker is positioned a distance from a faceplate of a remote plasma source. The ion blocker has openings to allow the plasma to flow through. The ion blocker is polarized relative to a showerhead positioned on an opposite side of the ion blocker so that there are substantially no plasma gas ions passing through the showerhead.