Invention Application
- Patent Title: TRANSPORT APPARATUS AND SUBSTRATE PROCESSING APPARATUS
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Application No.: US17832677Application Date: 2022-06-05
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Publication No.: US20230005773A1Publication Date: 2023-01-05
- Inventor: HAO YU , MITSURU MIYAZAKI , Takuya INOUE
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2021-109455 20210630
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/687 ; H01L21/67 ; C23C16/455

Abstract:
A transport apparatus includes a hand, a drive mechanism, a cover member, and a gas supply member. The hand is configured to hold a wafer. The drive mechanism is configured to transport the wafer by moving the hand. The cover member has an opposing surface opposed to a surface of the wafer held by the hand and is formed with a plurality of holes opened in the opposing surface. The gas supply member is configured to supply an inert gas to the surface of the wafer via the plurality of holes of the cover member. The plurality of holes are formed in the opposing surface so that an opening ratio of an outer peripheral portion of the opposing surface is higher than an opening ratio of a central portion of the opposing surface.
Public/Granted literature
- US12046500B2 Transport apparatus and substrate processing apparatus Public/Granted day:2024-07-23
Information query
IPC分类: