Invention Publication
- Patent Title: DEVICE AND METHOD FOR GENERATING PHOTOMASKS
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Application No.: US17983972Application Date: 2022-11-09
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Publication No.: US20230141388A1Publication Date: 2023-05-11
- Inventor: Charlotte BEYLIER , Mauricio GARCIA SUAREZ , Pascal URARD , Guillaume LANDIE
- Applicant: STMicroelectronics (Crolles 2) SAS , STMicroelectronics SA
- Applicant Address: FR Crolles
- Assignee: STMicroelectronics (Crolles 2) SAS,STMicroelectronics SA
- Current Assignee: STMicroelectronics (Crolles 2) SAS,STMicroelectronics SA
- Current Assignee Address: FR Crolles; FR Montrouge
- Priority: FR 11964 2021.11.10
- Main IPC: G03F1/70
- IPC: G03F1/70 ; G03F7/20

Abstract:
The present description concerns a method that includes the compression, by a processor, of an image comprising first patterns by transforming the image into a first representation formed of two-point elements. The method also includes the execution, by a neural network, of an inference operation on the first representation to generate a second representation formed of two-point elements. The method further includes the generation of a lithographic mask based on the decompression of the second representation.
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