Invention Publication
- Patent Title: CLEANING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
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Application No.: US17906368Application Date: 2021-03-03
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Publication No.: US20230173557A1Publication Date: 2023-06-08
- Inventor: Koichi NAKAJIMA , Satoshi CHIDA , Satoshi CHINO
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Minato-ku, Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Minato-ku, Tokyo
- Priority: JP 20046448 2020.03.17
- International Application: PCT/JP2021/008201 2021.03.03
- Date entered country: 2022-09-15
- Main IPC: B08B7/00
- IPC: B08B7/00 ; H01J37/32 ; H01L21/3205 ; H01L21/683 ; C23C16/458 ; C23C16/44 ; C23C16/06 ; C23C16/509
Abstract:
A cleaning method according to one aspect of the present disclosure which cleans an electrostatic chuck includes exposing the electrostatic chuck to plasma and maintaining a relationship between a potential of the electrostatic chuck and a potential of the plasma such that electron current is introduced from the plasma toward the electrostatic chuck.
Information query
