Invention Publication
- Patent Title: SEMICONDUCTOR DEVICE
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Application No.: US18102808Application Date: 2023-01-30
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Publication No.: US20230178656A1Publication Date: 2023-06-08
- Inventor: Shunpei Yamazaki , Yoshiyuki Kobayashi , Daisuke Matsubayashi , Akihisa Shimomura , Daigo Ito
- Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Applicant Address: JP Atsugi-shi
- Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Current Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Current Assignee Address: JP Atsugi-shi
- Priority: JP 13134865 2013.06.27 JP 13156551 2013.07.29
- The original application number of the division: US14313008 2014.06.24
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/66 ; H01L29/423

Abstract:
To provide a semiconductor device in which a large current can flow. To provide a semiconductor device which can be driven stably at a high driving voltage. The semiconductor device includes a semiconductor layer, a first electrode and a second electrode electrically connected to the semiconductor layer and apart from each other in a region overlapping with the semiconductor layer, a first gate electrode and a second gate electrode with the semiconductor layer therebetween, a first gate insulating layer between the semiconductor layer and the first gate electrode, and a second gate insulating layer between the semiconductor layer and the second gate electrode. The first gate electrode overlaps with part of the first electrode, the semiconductor layer, and part of the second electrode. The second gate electrode overlaps with the semiconductor layer and part of the first electrode, and does not overlap with the second electrode.
Information query
IPC分类: