Invention Application
- Patent Title: HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD
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Application No.: US17777586Application Date: 2020-10-21
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Publication No.: US20230018090A1Publication Date: 2023-01-19
- Inventor: Takahiro KITAZAWA , Yukio ONO , Oma NAKAJIMA
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP Kyoto
- Priority: JP2019-232583 20191224
- International Application: PCT/JP2020/039550 WO 20201021
- Main IPC: H01L21/67
- IPC: H01L21/67

Abstract:
Even a radiation thermometer using a quantum infrared sensor appropriately measures the temperature of a substrate irradiated with a flash of light. A heat treatment apparatus includes a quantum infrared sensor configured to measure a temperature of the first substrate and a temperature of the second substrate. The heat treatment apparatus further includes a temperature correction unit configured to correct, using a correction coefficient calculated based on the reference temperature and the shift temperature, a temperature of the second substrate on which second heat treatment having irradiation with the flash of light is performed, the temperature being measured by the quantum infrared sensor.
Public/Granted literature
- US12154800B2 Heat treatment apparatus and heat treatment method Public/Granted day:2024-11-26
Information query
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