Invention Publication
- Patent Title: SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
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Application No.: US18145138Application Date: 2022-12-22
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Publication No.: US20230203669A1Publication Date: 2023-06-29
- Inventor: Shin Hwa KANG , Seung Un OH , Young Ho PARK , Sang Hyeon RYU , Kwang Sup KIM
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Chungcheongnam-do
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Chungcheongnam-do
- Priority: KR 20210189937 2021.12.28
- Main IPC: C23F1/08
- IPC: C23F1/08 ; H01L21/68

Abstract:
Disclosed is a method for treating a substrate, on which a plurality of reference marks and a pattern are formed. The method includes a process preparing operation, a location information acquiring operation of acquiring information on an actual location of the pattern, and a process executing operation of supplying a treatment liquid to the substrate, and heating the substrate by irradiating laser light to the pattern on the substrate, to which the treatment liquid is applied, the location information acquiring operation includes acquiring information on actual locations of, among the plurality of reference marks, at least three reference marks, and acquiring information of the actual location of the pattern through the information of the actual locations of the reference marks.
Information query
IPC分类: