发明公开
- 专利标题: SUBSTRATE PROCESSING DEVICE AND CONTROL METHOD FOR SUBSTRATE PROCESSING DEVICE
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申请号: US18147910申请日: 2022-12-29
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公开(公告)号: US20230211622A1公开(公告)日: 2023-07-06
- 发明人: Sang Min HA , Hyeong Jun CHO , Jae Hong KIM , Sang Hyun SON , Young-Joo SEO
- 申请人: SEMES CO., LTD.
- 申请人地址: KR Cheonan-si
- 专利权人: SEMES CO., LTD.
- 当前专利权人: SEMES CO., LTD.
- 当前专利权人地址: KR Cheonan-si
- 优先权: KR 20210192303 2021.12.30 KR 20220126630 2022.10.04
- 主分类号: B41M5/00
- IPC分类号: B41M5/00 ; B41J2/015 ; C09D11/30
摘要:
Disclosed is a substrate processing device which includes a substrate transfer part on which a transfer object is received and a jetting system part includes an ink jet body that jets and prints ink on the transfer object over an upper surface of the substrate transfer part, an ink module transfer part that transfers the ink jet body, an encoder disposed around the ink module transfer part to output a movement signal per unit movement distance of the ink module transfer part, an ink ejection controller that interworks with the ink jet body to control an ink jetting timing of the ink jet body, and a signal splitter that interworks with the encoder to count the movement signal, reset a width of the counted movement signal, and transmit the movement signal, the width of which is reset, to the ink ejection controller.
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