- 专利标题: SRAM Circuits with Aligned Gate Electrodes
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申请号: US18182489申请日: 2023-03-13
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公开(公告)号: US20230225100A1公开(公告)日: 2023-07-13
- 发明人: Fang Chen , Jhon Jhy Liaw , Min-Chang Liang , Ren-Fen Tsui , Shih-Chi Fu , Yen-Huei Chen
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址: TW Hsinchu
- 主分类号: H10B10/00
- IPC分类号: H10B10/00
摘要:
A device includes a Static Random Access Memory (SRAM) array, and an SRAM cell edge region abutting the SRAM array. The SRAM array and the SRAM cell edge region in combination include first gate electrodes having a uniform pitch. A word line driver abuts the SRAM cell edge region. The word line driver includes second gate electrodes, and the first gate electrodes have lengthwise directions aligned to lengthwise directions of respective ones of the second gate electrodes.
公开/授权文献
- US12041761B2 SRAM circuits with aligned gate electrodes 公开/授权日:2024-07-16
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