- 专利标题： Composition Comprising a Siloxane and an Alkane for Avoiding Pattern Collapse When Treating Patterned Materials with Line-Space Dimensions of 50 NM or Below
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申请号： US18004348申请日： 2021-06-29
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公开(公告)号： US20230274930A1公开(公告)日： 2023-08-31
- 发明人: Chi Yueh KAO , Mei Chin SHEN , Andreas KLIPP , Haci Osman GUEVENC , Daniel LOEFFLER
- 申请人： BASF SE
- 申请人地址： DE Ludwigshafen am Rhein
- 专利权人： BASF SE
- 当前专利权人： BASF SE
- 当前专利权人地址： DE Ludwigshafen am Rhein
- 优先权： EP 185047.6 2020.07.09
- 国际申请： PCT/EP2021/067916 2021.06.29
- 进入国家日期： 2023-01-05
- 主分类号： H01L21/02
- IPC分类号： H01L21/02 ; G03F7/40 ; C11D11/00 ; C11D7/50 ; C11D3/37
摘要：
Described herein is a non-aqueous composition including
(a) an organic solvent; and
(b) at least one additive of formulae I or II
where
R1 is H
R2 is selected from the group consisting of H, C1 to C10 alkyl, C1 to C10 alkoxy, C6 to C10 aryl, and C6 to C10 aroxy,
R3 is selected from the group consisting of R2,
R4 is selected from the group consisting of C1 to C10 alkyl, C1 to C10 alkoxy, C6 to C10 aryl, and C6 to C10 aroxy,
R10, R12 are independently selected from the group consisting of C1 to C19 alkyl and C1 to C10 alkoxy,
m is 1, 2 or 3, and
n is 0 or an integer from 1 to 100.
(a) an organic solvent; and
(b) at least one additive of formulae I or II
where
R1 is H
R2 is selected from the group consisting of H, C1 to C10 alkyl, C1 to C10 alkoxy, C6 to C10 aryl, and C6 to C10 aroxy,
R3 is selected from the group consisting of R2,
R4 is selected from the group consisting of C1 to C10 alkyl, C1 to C10 alkoxy, C6 to C10 aryl, and C6 to C10 aroxy,
R10, R12 are independently selected from the group consisting of C1 to C19 alkyl and C1 to C10 alkoxy,
m is 1, 2 or 3, and
n is 0 or an integer from 1 to 100.
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