- 专利标题： METHOD OF PERFORMING METROLOGY, METHOD OF TRAINING A MACHINE LEARNING MODEL, METHOD OF PROVIDING A LAYER COMPRISING A TWO-DIMENSIONAL MATERIAL, METROLOGY APPARATUS
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申请号： US18023708申请日： 2021-08-17
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公开(公告)号： US20230280662A1公开(公告)日： 2023-09-07
- 发明人: Evgenia KURGANOVA , Marijke SCOTUZZI , Vina FARAMARZI , Bastiaan Maurice VAN DEN BROEK
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EP 196358.4 2020.09.16 EP 191255.5 2021.08.13
- 国际申请： PCT/EP2021/072787 2021.08.17
- 进入国家日期： 2023-02-27
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/20
摘要：
Methods of performing metrology. In one arrangement a substrate has a layer. The layer comprises a two-dimensional material. A target portion of the layer is illuminated with a beam of radiation and a distribution of radiation in a pupil plane is detected to obtain measurement data. The measurement data is processed to obtain metrology information about the target portion of the layer. The illuminating, detecting and processing are performed for plural different target portions of the layer to obtain metrology information for the plural target portions of the layer.
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