公开(公告)号：US20230280662A1

公开(公告)日：2023-09-07

申请号：US18023708

申请日：2021-08-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Evgenia KURGANOVA ,  Marijke SCOTUZZI ,  Vina FARAMARZI ,  Bastiaan Maurice VAN DEN BROEK

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/706841 ,  G03F7/70133

Abstract: Methods of performing metrology. In one arrangement a substrate has a layer. The layer comprises a two-dimensional material. A target portion of the layer is illuminated with a beam of radiation and a distribution of radiation in a pupil plane is detected to obtain measurement data. The measurement data is processed to obtain metrology information about the target portion of the layer. The illuminating, detecting and processing are performed for plural different target portions of the layer to obtain metrology information for the plural target portions of the layer.