An ion beam processing tool includes a plasma source, a grid arrangement positioned proximate the plasma source to generate an ion beam, a beam deflector positioned adjacent the grid arrangement, and a controller configured to control the beam deflector to deflect the ion beam to generate a tilted ion beam. A method includes generating an ion beam, directing the ion beam at a target, deflecting the ion beam in a first direction to remove a first portion of material from the target, and deflecting the ion beam in a second direction different than the first direction to remove a second portion of material from the target.