Invention Publication
- Patent Title: METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE
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Application No.: US18245347Application Date: 2021-09-15
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Publication No.: US20230331946A1Publication Date: 2023-10-19
- Inventor: Shunsuke OTAKE , Kazuyuki MITSUKURA , Shinji SHIMAOKA , Hiroaki FUJITA , Masaki TAKAHASHI
- Applicant: Resonac Corporation
- Applicant Address: JP Minato-ku, Tokyo
- Assignee: Resonac Corporation
- Current Assignee: Resonac Corporation
- Current Assignee Address: JP Minato-ku, Tokyo
- Priority: WO TJP2020035462 2020.09.18
- International Application: PCT/JP2021/033973 2021.09.15
- Date entered country: 2023-03-15
- Main IPC: C08J5/24
- IPC: C08J5/24 ; H01L23/498 ; H01L21/48 ; B32B15/14

Abstract:
A method for manufacturing a substrate material for a semiconductor package, including a step of increasing a temperature of a laminated body in which a metal foil, one or more prepregs, and a metal foil are laminated in this order to a hot-press temperature while pressurizing the laminated body. The prepreg contains an inorganic fiber base material and a thermosetting resin composition. A content of the thermosetting resin composition is 40 to 80% by mass on the basis of a mass of the prepreg. In the step of increasing the temperature of the laminated body to the hot-press temperature while pressurizing the laminated body, the laminated body is heated in a condition in which the lowest melt viscosity of the prepreg is 5000 Pa·s or less.
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