- 专利标题: TRANSITION METAL DICHALCOGENIDE (TMD) TRANSISTOR STRUCTURE
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申请号: US17728469申请日: 2022-04-25
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公开(公告)号: US20230343833A1公开(公告)日: 2023-10-26
- 发明人: Liqiao Qin , Heng Wu , Ruilong Xie , Tian Shen
- 申请人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: H01L29/24
- IPC分类号: H01L29/24 ; H01L27/092 ; H01L21/8238 ; H01L29/10
摘要:
A semiconductor device including a semiconductor substrate, a lower metal contact disposed upon the semiconductor substrate, a gate structure disposed upon the lower metal contact, an upper metal contact disposed upon the gate structure, and a plurality of semiconductor carriers disposed in contact with both the lower metal contact and the upper metal contact, the plurality of semiconductor carriers disposed in channels passing through the gate structure.
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