- 专利标题: COMPOSITION, BASE MATERIAL WITH SURFACE LAYER AND METHOD FOR PRODUCING BASE MATERIAL WITH SURFACE LAYER
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申请号: US18451448申请日: 2023-08-17
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公开(公告)号: US20230392038A1公开(公告)日: 2023-12-07
- 发明人: Kazumi KOUDA , Takafumi KAWAKAMI , Eiichiro ANRAKU , Keigo MATSUURA , Makoto UNO
- 申请人: AGC Inc.
- 申请人地址: JP Tokyo
- 专利权人: AGC Inc.
- 当前专利权人: AGC Inc.
- 当前专利权人地址: JP Tokyo
- 优先权: JP 21035376 2021.03.05
- 主分类号: C09D171/02
- IPC分类号: C09D171/02 ; C09D5/00 ; C09D7/63 ; C08G65/22 ; C08G65/336 ; C08K5/5419
摘要:
The object is to provide a composition capable of forming a surface layer excellent in abrasion resistance, a base material with the surface layer, and a method for producing the base material with the surface layer. The composition of the present invention comprises a fluorinated ether compound having a poly(oxyfluoroalkylene) chain and a reactive silyl group, and a crosslinking agent having a plurality of reactive silyl groups and no poly(oxyfluoroalkylene) chain.
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