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    COMPOUND, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING SURFACE TREATMENT AGENT
    3.
    发明公开
    COMPOUND, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING SURFACE TREATMENT AGENT 审中-公开

    公开(公告)号：US20230406869A1

    公开(公告)日：2023-12-21

    申请号：US18460114

    申请日：2023-09-01

    申请人： AGC Inc.

    发明人： Makoto UNO ,  Eiichiro ANRAKU ,  Takafumi KAWAKAMI ,  Keigo MATSUURA

    IPC分类号： C07F7/18

    CPC分类号： C07F7/1876

    摘要： A compound represented by the following formula (A1) or (A2):


    G1-(CH2)m1—CHX1—(CH2)n1-M   Formula (A1)



    M-(CH2)n2—CHX1—(CH2)m2-G2(CH2)m3—CHX1—(CH2)n3-M   Formula (A2).

    Where in the formula (A1) and (A2), G1, G2, X1, M, n1, n2, n3, m1, m2, and m3 are as defined in the disclosure. A method for producing a compound represented by the following formula (B1) or (B2), where M in the compound of formula (A1) or (A2) is converted into a hydrogen or hydrocarbon group represented by R3:


    G1-(CH2)m1—CHX1—(CH2)n1—R3   Formula (B1)



    R3—(CH2)n2—CHX1—(CH2)m2-G2-(CH2)m3—CHX1—(CH2)n3—R3   Formula (B2).

    Where in the formulas B1 and B2, G1, G2, X1, R3, n1, n2, n3, m1, m2, and m3 are as defined in the disclosure.

    ARTICLE WITH SURFACE LAYER
    6.
    发明申请
    ARTICLE WITH SURFACE LAYER 有权

    公开(公告)号：US20220106495A1

    公开(公告)日：2022-04-07

    申请号：US17644386

    申请日：2021-12-15

    申请人： AGC Inc.

    发明人： Yusuke TOMIYORI ,  Taiki HOSHINO ,  Eiichiro ANRAKU ,  Kenji ISHIZEKI ,  Ryoji AKIYAMA

    IPC分类号： C09D171/02 ,  C08G65/336 ,  C07F7/18

    摘要： To provide an article with a surface layer, that is excellent in fingerprint stain removability, friction resistance, and adhesion to a protective film of the surface layer.
    An article with a surface layer, comprising a base material and a surface layer provided on the surface of the base material and characterized in that the surface layer contains groups having —O— between carbon-carbon atoms of a fluoroalkyl group with two or more carbon atoms, and the normalized F intensity obtained by preparing a glass containing 4.96 mass % of fluorine atoms (IGS G4 Fluoride Opal Glass manufactured by Bureau of Analysed Samples Ltd.) as a standard sample, measuring, by an X-ray fluorescence spectrometer, the fluorine atom intensity in the surface layer and the fluorine atom intensity in the standard sample, respectively, and dividing the fluorine atom intensity in the surface layer by the fluorine atom intensity in the standard sample, is from 0.38 to 0.53.

    FLUORINATED COMPOUND, FLUORINATED COMPOUND-CONTAINING COMPOSITION, COATING LIQUID, ARTICLE, AND METHOD OF PRODUCING THE SAME
    8.
    发明申请
    FLUORINATED COMPOUND, FLUORINATED COMPOUND-CONTAINING COMPOSITION, COATING LIQUID, ARTICLE, AND METHOD OF PRODUCING THE SAME 有权

    公开(公告)号：US20210269592A1

    公开(公告)日：2021-09-02

    申请号：US17315454

    申请日：2021-05-10

    申请人： AGC Inc.

    发明人： Eiichiro ANRAKU ,  Keigo MATSUURA ,  Taiki HOSHINO

    IPC分类号： C08G65/323 ,  C09D171/00 ,  B05D5/08 ,  C08G65/336

    摘要： A fluorinated compound and a fluorinated compound-containing composition which enable formation of a surface layer having high friction resistance and fingerprint marks removability even if the fluorinated compound has a fluorinated organic group having a shorter chain are provided. A coating liquid, an article including the surface layer on its surface, and a method of producing the same are also provided.
    A fluorinated compound represented by [(Rf-A-)2N-]a1Q1[-T]b1 (wherein Rf: a fluoroalkyl group or a group having —O— between carbon atoms of a fluoroalkyl group having two or more carbon atoms, A: a divalent organic group having no fluorine atom, Q1: a a1+b1 valent organic group, T: —Si(R)3-c(L)c, R: an alkyl group, L: a hydrolyzable group or a hydroxyl group, a1: an integer of 1 or more, b1: an integer of 2 or more, and c: 2 or 3).

    COMPOSITION AND ARTICLE
    9.
    发明申请
    COMPOSITION AND ARTICLE 有权

    公开(公告)号：US20210348024A1

    公开(公告)日：2021-11-11

    申请号：US17443038

    申请日：2021-07-20

    申请人： AGC Inc.

    发明人： Keigo MATSUURA ,  Taiki HOSHINO ,  Kiyotaka TAKAO ,  Makoto UNO ,  Eiichiro ANRAKU ,  Motoshi AOYAMA ,  Naoki KATSUKI ,  Yusuke TOMIYORI ,  Toyokazu ENTA ,  Hiromasa YAMAMOTO

    IPC分类号： C09D183/10 ,  C09D5/00 ,  C09D7/20

    摘要： To provide a composition with which a surface layer excellent in abrasion resistance and sliding resistance can be formed, and an article.
    The composition of the present invention comprises a compound represented by the formula (1) and a compound represented by the formula (2), wherein the ratio of the number of moles of the group represented by —CF3 in Rf1 in the formula (1) to the total of the number of moles of the group represented by —CF2— closest to Y1 in Rf2 in the formula (1), the number of moles of the group represented by —CF2— closest to Y2 in Rf3 in the formula (2) and the number of moles of the group represented by —CF2— closest to Y3 in Rf3 in the formula (2), is from 0.001 to 0.1: Rf1—(OX1)m1—O—Rf2—Y1—[Si(R1)n1L13-n1]g1  (1) [L23-n2(R2)n2Si]g2—Y2—Rf3—(OX2)m2—O—Rf4—Y3—[Si(R3)n3L33-n3]g3  (2)