- 专利标题： LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGING A TRAJECTORY OF PARTICULATE DEBRIS
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申请号： US17794897申请日： 2020-12-24
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公开(公告)号： US20230063156A1公开(公告)日： 2023-03-02
- 发明人: Ronald Peter ALBRIGHT , Kursat BAL , Vadim Yevgenyevich BANINE , Richard Joseph BRULS , Sjoerd Frans DE VRIES , Olav Waldemar Vladimir FRIJNS , Yang-Shan HUANG , Zhuangxiong HUANG , Johannes Henricus Wilhelmus JACOBS , Johannes Hubertus Josephina MOORS , Georgi Nanchev NENCHEV , Andrey NIKIPELOV , Thomas Maarten RAASVELD , Manish RANJAN , Edwin TE SLIGTE , Karl Robert UMSTADTER , Eray UZGÖREN , Marcus Adrianus VAN DE KERKHOF , Parham YAGHOOBI
- 申请人： ASML Holding N.V. , ASML Netherlands B.V.
- 申请人地址： NL Veldhoven; NL Veldhoven
- 专利权人： ASML Holding N.V.,ASML Netherlands B.V.
- 当前专利权人： ASML Holding N.V.,ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven; NL Veldhoven
- 国际申请： PCT/EP2020/087889 WO 20201224
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
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