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14 条记录 (耗时 0.02 秒)

    PARTICLE SUPPRESSION SYSTEMS AND METHODS
    1.
    发明申请
    PARTICLE SUPPRESSION SYSTEMS AND METHODS 有权

    公开(公告)号：US20210173315A1

    公开(公告)日：2021-06-10

    申请号：US16629337

    申请日：2018-07-18

    申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    发明人： Yang-Shan HUANG ,  Marcel Joseph Louis BOONEN ,  Han-Kwang NIENHUYS ,  Jacob BRINKERT ,  Richard Joseph BRULS ,  Peter Conrad KOCHERSPERGER

    IPC分类号： G03F7/20

    摘要： A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.

    Lithographic Apparatus and Device Manufacturing Method
    5.
    发明申请
    Lithographic Apparatus and Device Manufacturing Method 有权
    光刻设备和器件制造方法

    公开(公告)号：US20130314684A1

    公开(公告)日：2013-11-28

    申请号：US13871328

    申请日：2013-04-26

    申请人： ASML NETHERLANDS B.V.

    发明人： Yang-Shan HUANG ,  Theodorus Petrus Maria Cadee

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70775 ,  G03F7/70725 ,  G03F7/70758

    摘要： A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.

    摘要翻译： 基板台用于光刻设备中。 衬底台包括构造成保持衬底的衬底台和用于使用的定位装置相对于光刻设备的投影系统定位衬底台。 所述定位装置包括安装到所述基板台的第一定位构件和与所述第一定位构件配合以定位所述基板台的第二定位构件。 第二定位构件安装到支撑结构。 衬底台还包括致动器，该致动器被布置成相对于支撑结构在基本上固定的水平位置上在衬底台的底表面上施加垂直力。

    A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
    6.
    发明申请
    A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS 有权

    公开(公告)号：US20220397830A1

    公开(公告)日：2022-12-15

    申请号：US17776369

    申请日：2020-10-12

    申请人： ASML NETHERLANDS B.V.

    发明人： Yang-Shan HUANG ,  Nicolaas TEN KATE

    IPC分类号： G03F7/20

    摘要： A fluid handling system that includes a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also includes a mechanism configured to vibrate a vibration component in contact with the immersion liquid.

    A Positioning System and a Method for Positioning a Substage or a Stage with Respect to a Frame
    8.
    发明申请
    A Positioning System and a Method for Positioning a Substage or a Stage with Respect to a Frame 有权

    公开(公告)号：US20210373446A1

    公开(公告)日：2021-12-02

    申请号：US16763925

    申请日：2018-10-08

    申请人： ASML Netherlands B.V.

    发明人： Yang-Shan HUANG ,  Petrus Theodorus RUTGERS

    IPC分类号： G03F7/20 ,  H02K41/03 ,  H02K21/44

    摘要： A method for positioning a substage (9), supported by a main stage (5), relative to a reference object, the substage moveable in a direction (7) between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems (119, 121), each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.