公开(公告)号：US20230063156A1

公开(公告)日：2023-03-02

申请号：US17794897

申请日：2020-12-24

申请人： ASML Holding N.V. ,  ASML Netherlands B.V.

发明人： Ronald Peter ALBRIGHT ,  Kursat BAL ,  Vadim Yevgenyevich BANINE ,  Richard Joseph BRULS ,  Sjoerd Frans DE VRIES ,  Olav Waldemar Vladimir FRIJNS ,  Yang-Shan HUANG ,  Zhuangxiong HUANG ,  Johannes Henricus Wilhelmus JACOBS ,  Johannes Hubertus Josephina MOORS ,  Georgi Nanchev NENCHEV ,  Andrey NIKIPELOV ,  Thomas Maarten RAASVELD ,  Manish RANJAN ,  Edwin TE SLIGTE ,  Karl Robert UMSTADTER ,  Eray UZGÖREN ,  Marcus Adrianus VAN DE KERKHOF ,  Parham YAGHOOBI

IPC分类号： G03F7/20

摘要： An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

公开(公告)号：US20200341366A1

公开(公告)日：2020-10-29

申请号：US16765339

申请日：2018-11-27

申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V

发明人： Derk Servatius Gertruda BROUNS ,  Joshua ADAMS ,  Aage BENDIKSEN ,  Richard JACOBS ,  Andrew JUDGE ,  Veera Venkata Narasimha Narendra Phani KOTTAPALLI ,  Joseph Harry LYONS ,  Theodorus Marinus MODDERMAN ,  Manish RANJAN ,  Marcus Adrianus VAN DE KERKHOF ,  Xugang XIONG

IPC分类号： G03F1/64 ,  G03F1/00 ,  G03F7/20

摘要： An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

公开(公告)号：US20220276573A1

公开(公告)日：2022-09-01

申请号：US17624901

申请日：2020-06-04

申请人： ASML NETHERLANDS B.V.

发明人： Marcus Adrianus VAN DE KERKHOF ,  Manish RANJAN

IPC分类号： G03F7/20

摘要： A lithographic apparatus including a substrate stage for supporting a structure in a compartment, the compartment having a compartment surface facing a top surface of the substrate in at least one operational configuration; and a soft coating on the compartment surface for capturing particles. A heat shield or component thereof for a lithographic apparatus, the heat shield or component thereof including a soft coating on at least one surface for capturing particles and a lithographic apparatus including such a heat shield.

公开(公告)号：US20170176877A1

公开(公告)日：2017-06-22

申请号：US15451358

申请日：2017-03-06

申请人： ASML NETHERLANDS B.V.

发明人： Manish RANJAN ,  Carlo Cornelis Maria LUIJTEN ,  Franciscus Johannes Joseph JANSSEN ,  Maksym CHERNYSHOV

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/70633 ,  G03F7/70716 ,  G03F7/70933

摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus disposed in a space between the projection system and the substrate table. The temperature control device is configured to control the temperature of the gas in the space after the gas passes through the opening.