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公开(公告)号：US20230063156A1
公开(公告)日：2023-03-02
申请号：US17794897
申请日：2020-12-24
发明人： Ronald Peter ALBRIGHT , Kursat BAL , Vadim Yevgenyevich BANINE , Richard Joseph BRULS , Sjoerd Frans DE VRIES , Olav Waldemar Vladimir FRIJNS , Yang-Shan HUANG , Zhuangxiong HUANG , Johannes Henricus Wilhelmus JACOBS , Johannes Hubertus Josephina MOORS , Georgi Nanchev NENCHEV , Andrey NIKIPELOV , Thomas Maarten RAASVELD , Manish RANJAN , Edwin TE SLIGTE , Karl Robert UMSTADTER , Eray UZGÖREN , Marcus Adrianus VAN DE KERKHOF , Parham YAGHOOBI
IPC分类号： G03F7/20
摘要： An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
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公开(公告)号：US20170200523A1
公开(公告)日：2017-07-13
申请号：US15338835
申请日：2016-10-31
CPC分类号： G21K1/062 , G02B19/0095 , G03F1/24 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G03F7/70958 , H05G2/008
摘要： Disclosed is an EUV system element having a hydrogen diffusion barrier including a region implanted with species (e.g., ions energetic neutral atoms) of a non-hydrogen gaseous material. Also disclosed is a method of making such a component including the step of implanting species of a non-hydrogen gaseous material to form a hydrogen diffusion barrier and a method of treating an EUV system element including the step of implanting species of a non-hydrogen gaseous material to prevent hydrogen adsorption and diffusion. Also disclosed is subjecting an EUV system element to a flux of non-hydrogen gas ions to displace hydrogen ions in one or more layers of the EUV system element with the non-hydrogen gas species so that the gas ions protect the EUV system element against hydrogen damage.
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