Invention Publication
- Patent Title: COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
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Application No.: US18218193Application Date: 2023-07-05
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Publication No.: US20240004297A1Publication Date: 2024-01-04
- Inventor: Tatsuya KASAI , Ayaka Furusawa , Kazunori Sakai , Ryuichi Serizawa
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP 21001316 2021.01.07
- Main IPC: G03F7/11
- IPC: G03F7/11 ; C08G77/04 ; H01L21/027

Abstract:
A composition includes: a solvent; and a compound including: at least one structural unit selected from the group consisting of a structural unit represented by formula (1-1) and a structural unit represented by formula (1-2); and a structural unit represented by formula (2-1). X is a monovalent organic group other than an alkoxy group, the monovalent organic group having 1 to 20 carbon atoms and having at least one fluorine atom; Y is a monovalent organic group having 1 to 20 carbon atoms, a hydroxy group, or a halogen atom; R0 is a substituted or unsubstituted divalent hydrocarbon group having 1 to 20 carbon atoms; R1 is a monovalent organic group having 1 to 20 carbon atoms and having no fluorine atom, a hydroxy group, a hydrogen atom, or a halogen atom; and R2 is a substituted or unsubstituted divalent hydrocarbon group having 1 to 20 carbon atoms.
Information query
IPC分类: