公开(公告)号：US20240004297A1

公开(公告)日：2024-01-04

申请号：US18218193

申请日：2023-07-05

Applicant: JSR CORPORATION

Inventor： Tatsuya KASAI ,  Ayaka Furusawa ,  Kazunori Sakai ,  Ryuichi Serizawa

IPC: G03F7/11 ,  C08G77/04 ,  H01L21/027

CPC classification number: G03F7/11 ,  C08G77/04 ,  H01L21/0274 ,  C08G77/80

Abstract: A composition includes: a solvent; and a compound including: at least one structural unit selected from the group consisting of a structural unit represented by formula (1-1) and a structural unit represented by formula (1-2); and a structural unit represented by formula (2-1). X is a monovalent organic group other than an alkoxy group, the monovalent organic group having 1 to 20 carbon atoms and having at least one fluorine atom; Y is a monovalent organic group having 1 to 20 carbon atoms, a hydroxy group, or a halogen atom; R0 is a substituted or unsubstituted divalent hydrocarbon group having 1 to 20 carbon atoms; R1 is a monovalent organic group having 1 to 20 carbon atoms and having no fluorine atom, a hydroxy group, a hydrogen atom, or a halogen atom; and R2 is a substituted or unsubstituted divalent hydrocarbon group having 1 to 20 carbon atoms.

公开(公告)号：US20220146940A1

公开(公告)日：2022-05-12

申请号：US17584456

申请日：2022-01-26

Applicant: JSR CORPORATION

Inventor： Tatsuya KASAI ,  Tomohiro Matsuki ,  Yusuke Anno ,  Tomoaki Seko ,  Tatsuya Sakai

IPC: G03F7/11 ,  C08G77/50 ,  C08G77/26 ,  C09D183/08 ,  H01L21/027

Abstract: A composition includes a solvent and at least one compound selected from the group consisting of: a first compound which comprises a first structural unit comprising a Si—H bond, and a second structural unit represented by formula (2), and a second compound which comprises the second structural unit represented by the formula (2). X represents a monovalent organic group having 1 to 20 carbon atoms which comprises a nitrogen atom; e is an integer of 1 to 3; R4 represents a monovalent organic group having 1 to 20 carbon atoms, or a hydroxy group, a hydrogen atom, or a halogen atom; and f is an integer of 0 to 2. A sum of e and f is no greater than 3. In the case where the at least one compound is the second compound, f is 1 or 2, and at least one R4 represents a hydrogen atom.

公开(公告)号：US20250044701A1

公开(公告)日：2025-02-06

申请号：US18919818

申请日：2024-10-18

Applicant: JSR CORPORATION

Inventor： Kazunori SAKAI ,  Tatsuya KASAI ,  Ayaka SUZUKI ,  Akitaka NII

IPC: G03F7/00 ,  C08K5/5419 ,  C09D133/06 ,  G03F7/039 ,  G03F7/075 ,  G03F7/16 ,  H01L21/027

Abstract: A method for producing a semiconductor substrate includes: applying a silicon-containing composition directly or indirectly to a substrate to form a silicon-containing film; applying a composition for forming a resist film to the silicon-containing film to form a resist film; exposing the resist film to radiation; and developing at least the exposed resist film. The silicon-containing composition includes: a silicon-containing compound; a polymer including a structural unit represented by formula (1); and a solvent. A content of the silicon-containing compound in the silicon-containing composition relative to 100% by mass of components other than the solvent in the silicon-containing composition is from 50% to 99.9% by mass. RA1 is a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and RA2 is a monovalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US20190101672A1

公开(公告)日：2019-04-04

申请号：US16078238

申请日：2017-03-15

Applicant: JSR CORPORATION

Inventor： Tatsuya KASAI ,  Katsuya NAGAYA ,  Toshihiro OTSUKI

IPC: G02B5/20 ,  H01L27/146 ,  G02B5/00

Abstract: The object of the present invention is to provide an optical filter which has not only a high visible light transmittance, but also high light cut characteristics in the near-infrared wavelength region, and which is excellent in heat resistance. The optical filter of the present invention comprises a base material comprising a compound (S) having an absorption maximum in the region of 600 to 1150 nm and an antioxidant (P) having at least one phosphorus atom in a molecule, and a dielectric multilayer film formed on at least one surface of the base material.