Invention Publication
- Patent Title: THROUGH SILICON VIA MACRO WITH DENSE LAYOUT FOR PLACEMENT IN AN INTEGRATED CIRCUIT FLOORPLAN
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Application No.: US17854516Application Date: 2022-06-30
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Publication No.: US20240005078A1Publication Date: 2024-01-04
- Inventor: Michael Edward Griffith , Aaron Keiichi Horiuchi , Donald A. Clay , Eric William Busta , Hye Jung Stanford , Kathryn E. Wilcox , Ruochen Xie , Russell Schreiber , Stephen J. Dussinger , William Edwin Laub, JR. , Te-Hsuan Chen
- Applicant: Advanced Micro Devices, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Advanced Micro Devices, Inc.
- Current Assignee: Advanced Micro Devices, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: G06F30/392
- IPC: G06F30/392

Abstract:
A system and method for efficiently designing a through silicon via (TSV) macro blocks are described. In various implementations, the circuitry of a processor executes instructions of a place and route tool that provides automatic placement of macro blocks and standard cells on an integrated circuit die based on a copy of a netlist of the integrated circuit being designed and a copy of a standard cell library that includes a variety of standard cells and macro blocks. The processor places two functional macros in the floorplan with a channel between them. In the channel, the processor places a TSV macro that includes at least one boundary cell inside of the TSV macro. The processor prevents placement of a boundary cell adjacent to at least one side of the TSV macro despite empty space exists due to no standard cells or macros about the at least one side.
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