- 专利标题: SINX BASED SURFACE FINISH ARCHITECTURE
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申请号: US17855568申请日: 2022-06-30
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公开(公告)号: US20240006299A1公开(公告)日: 2024-01-04
- 发明人: Suddhasattwa Nad , Jason Steill , Yi Yang , Brandon C. Marin , Srinivas Venkata Ramanuja Pietambaram , Marcel Arlan Wall , Gang Duan , Jeremy D. Ecton
- 申请人: Intel Corporation
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 主分类号: H01L23/498
- IPC分类号: H01L23/498 ; H01L21/48
摘要:
Disclosed herein are microelectronics package architectures utilizing SiNx based surface finishes and methods of manufacturing the same. The microelectronics packages may include a core material, a first plurality of pads, and a silicon nitride layer. The first plurality of pads are attached to the core material. The silicon nitride layer is attached to the core material. The silicon nitride material defines respective openings to expose at least a portion of each of the first plurality of pads.
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