- 专利标题： SUBSTRATE POSITIONING FOR DEPOSITION MACHINE
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申请号： US18462261申请日： 2023-09-06
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公开(公告)号： US20240017555A1公开(公告)日： 2024-01-18
- 发明人: Jerry Chang , Jesse Lu , Matt Audet
- 申请人： Kateeva, Inc.
- 申请人地址： US CA Newark
- 专利权人： Kateeva, Inc.
- 当前专利权人： Kateeva, Inc.
- 当前专利权人地址： US CA Newark
- 分案原申请号： US17451561 2021.10.20
- 主分类号： B41J11/00
- IPC分类号： B41J11/00
摘要：
A deposition device is described. The deposition device has a substrate support and an imaging system disposed to image a portion of a substrate positioned on the substrate support. The imaging system comprises an LED light source and an imaging unit, and is coupled to a deposition assembly disposed across the substrate support.
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