SUBSTRATE POSITIONING FOR DEPOSITION MACHINE

    公开(公告)号:US20240017555A1

    公开(公告)日:2024-01-18

    申请号:US18462261

    申请日:2023-09-06

    Applicant: Kateeva, Inc.

    CPC classification number: B41J11/00218

    Abstract: A deposition device is described. The deposition device has a substrate support and an imaging system disposed to image a portion of a substrate positioned on the substrate support. The imaging system comprises an LED light source and an imaging unit, and is coupled to a deposition assembly disposed across the substrate support.

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