Invention Publication
- Patent Title: METHOD FOR PRODUCING X-RAY PHASE GRATINGS AND X-RAY GRATINGS PRODUCED BY THE METHOD
-
Application No.: US17812872Application Date: 2022-07-15
-
Publication No.: US20240018650A1Publication Date: 2024-01-18
- Inventor: Houxun Miao
- Applicant: Houxun Miao
- Applicant Address: US IN Zionsville
- Assignee: Houxun Miao
- Current Assignee: Houxun Miao
- Current Assignee Address: US IN Zionsville
- Main IPC: C23C16/455
- IPC: C23C16/455 ; G21K1/06 ; C23C16/40 ; C23C16/34

Abstract:
Disclosed herein is a method to produce hard x-ray phase gratings for x-ray multi-contrast imaging. The method is based on the conformal atomic layer deposition (ALD) of material with high x-ray refractive index decrement δ. The method is particularly suitable for submicron period x-ray phase grating fabrication. The fabrication process to produce x-ray phase gratings in this disclosure is compatible with standard semiconductor fabrication instrument and suitable for mass production.
Information query
IPC分类: