-
公开(公告)号：US11947055B2
公开(公告)日：2024-04-02
申请号：US17744841
申请日：2022-05-16
Applicant: Houxun Miao
Inventor： Houxun Miao
CPC classification number: G01T1/2002 , G01T1/242
Abstract: Disclosed herein is a pixelated x-ray scintillator with a multilayer reflector for x-ray detectors with simultaneous high spatial resolution and high quantum efficiency and fabrication method to produce the pixelated x-ray scintillator. The multilayer reflector provides high reflectivity for the emitted visible photons over a broad incident angle range, thus boosts the light output efficiency of the pixelated x-ray scintillator. The fabrication process to produce the pixelated scintillator with the multilayer reflector in this disclosure is compatible with standard semiconductor fabrication instrument and suitable for mass production.
-
公开(公告)号：US11813102B2
公开(公告)日：2023-11-14
申请号：US17450085
申请日：2021-10-06
Applicant: Houxun Miao
Inventor： Houxun Miao
CPC classification number: A61B6/484 , A61B6/4021 , A61B6/4035 , A61B6/4291 , G21K1/062 , G21K1/065 , G21K2201/061 , G21K2201/062 , G21K2201/067 , G21K2207/005
Abstract: Disclosed herein is an x-ray interferometer for x-ray phase contrast imaging including an x-ray source, an x-ray source grating, two x-ray phase gratings, an x-ray analyzer grating and an x-ray detector. An alternative interferometer includes a periodically structured x-ray source, two x-ray phase gratings, an x-ray analyzer grating and an x-ray detector. The phase gratings are placed much closer to the x-ray detector than to the x-ray source and the image object is positioned upstream and close to the phase gratings to achieve high sensitivity and large field-of-view simultaneously.
-
公开(公告)号：US20240018650A1
公开(公告)日：2024-01-18
申请号：US17812872
申请日：2022-07-15
Applicant: Houxun Miao
Inventor： Houxun Miao
IPC: C23C16/455 , G21K1/06 , C23C16/40 , C23C16/34
CPC classification number: C23C16/45529 , G21K1/067 , C23C16/402 , C23C16/403 , C23C16/34
Abstract: Disclosed herein is a method to produce hard x-ray phase gratings for x-ray multi-contrast imaging. The method is based on the conformal atomic layer deposition (ALD) of material with high x-ray refractive index decrement δ. The method is particularly suitable for submicron period x-ray phase grating fabrication. The fabrication process to produce x-ray phase gratings in this disclosure is compatible with standard semiconductor fabrication instrument and suitable for mass production.
-
4.发明公开公开(公告)号：US20230367023A1
公开(公告)日：2023-11-16
申请号：US17744841
申请日：2022-05-16
Applicant: Houxun Miao
Inventor： Houxun Miao
CPC classification number: G01T1/2002 , G01T1/242
Abstract: Disclosed herein is a pixelated x-ray scintillator with a multilayer reflector for x-ray detectors with simultaneous high spatial resolution and high quantum efficiency and fabrication method to produce the pixelated x-ray scintillator. The multilayer reflector provides high reflectivity for the emitted visible photons over a broad incident angle range, thus boosts the light output efficiency of the pixelated x-ray scintillator. The fabrication process to produce the pixelated scintillator with the multilayer reflector in this disclosure is compatible with standard semiconductor fabrication instrument and suitable for mass production.
-
-
-
Search Results
4
records
(took 0.007 seconds)
